kw.\*:("OXYDE NAISANT")
Results 1 to 2 of 2
Selection :
COMPOSITE OXIDE FILMS FORMED BY DE PLASMA ANODIZATION OF AL/GAASPU NF; ROBINSON GY.1981; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1981; VOL. 53; NO 1; PP. 416-420; BIBL. 17 REF.Article
CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR DEPOSITED AND THERMALLY GROWN SILICON NITRIDE FILMSHABRAKEN FHPM; KUIPER AEJ; OOSTROM AV et al.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 1; PP. 404-415; BIBL. 40 REF.Article